Extreme ultraviolet light sources supporting next-generation lithography

Sam Gunnell, Product Manager, Energetiq Technology
July 14, 2020

About this webinar

Moore’s Law continues to drive semiconductor integrated circuit shrinks down to 3 nm and below and an increased feature density without passing the cost to the consumer. The next generation of photolithography requires a paradigm shift from 193 nm to 13.5 nm exposure wavelengths. This drastic change in exposure wavelength has brought about many fundamental challenges, especially in optical metrology and EUV-compatible materials development.

Traditional sources of extreme ultraviolet light such as synchrotrons or laser-produced tin plasma sources are very large and expensive to acquire, operate and maintain.

Topics of presentation:

This webinar focuses on how an alternative light source, specifically designed for studying materials used in EUV technologies is used to overcome fundamental obstacles and advance research, enabling the introduction of EUV lithography to high volume manufacturing environments.

About the presenter

Sam Gunnell is a Product Manager at Energetiq Technology, focused on EUV light sources for semiconductor applications. Before becoming a Product Manager, Sam served as Energetiq’s Technical Sales Engineer for both Laser-Driven Light Source and EUV light sources.

About Energetiq

Energetiq Technology, Inc. is a high technology, ultra-bright light source subsidiary of Hamamatsu. Energetiq introduces breakthrough products using our patented, ultra-bright Laser-Driven Light Source (LDLS™) and Electrodeless Z-Pinch™ EUV technologies. These sources are used in a variety of markets, primarily in high-end semiconductor manufacturing, sensor testing for cell phones, and in a variety of drug discovery and medical applications.

Please visit Energetiq for more information.

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